The instrument is an open air 500 KV ion implanter, manufactured by High Voltage Engineering Europe (HVEE, The Netherlands) with ion sources model SO-55-1, SO-60, and SO-100 and an ion implantation stage.
Capabilities
Ion energy range: 50-500 keV
Ion Type: most elements from the periodic table
Ion current range: in excess uA depending on ion type
Target chamber vacuum: 10 -7 Torr
Sample temperature control: -196°C to 800°C
Sample irradiation area: up to 4 inch wafer size with 5 wafers loaded
Uses: ion implantation, ion beam mixing
Implant Station
The Implant stage allows for irradiations of up to five 4 inch wafers before loading/unloading with a range from liquid nitrogen temperatures to 800 degree of C.
Beams, 50 KV to 500 KV
H, He, Ar, N, O, In,
Capabilities
Ion energy range: 50-500 keV
Ion Type: most elements from the periodic table
Ion current range: in excess uA depending on ion type
Target chamber vacuum: 10 -7 Torr
Sample temperature control: -196°C to 800°C
Sample irradiation area: up to 4 inch wafer size with 5 wafers loaded
Uses: ion implantation, ion beam mixing
Implant Station
The Implant stage allows for irradiations of up to five 4 inch wafers before loading/unloading with a range from liquid nitrogen temperatures to 800 degree of C.
Beams, 50 KV to 500 KV
H, He, Ar, N, O, In,